专利类型:
相变材料专利导航
公开（公告）号:
US20210288254A1
申请日:
2021-06-01
申请局:
US
摘要:
In an embodiment, a method includes: growing a phase change material on a platform configured for a semiconductor workpiece process; setting the phase change material to an amorphous state; performing the semiconductor workpiece process within a semiconductor processing chamber; and measuring resistance across two points along the phase change material.
原始专利权人:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
当前专利权人:
Taiwan Semiconductor Manufacturing Co TSMC Ltd